GATE 2026 Registration Deadline Extended: Apply Now

IIT Guwahati has extended the registration deadline for GATE 2026, allowing candidates to apply without late fees until October 6, 2025. The exam will take place on February 7, 8, 14, and 15, 2026. This article outlines key details about the application process, including fees and test structure. Don't miss your chance to register for this important engineering examination!

By Ambika Singh Sep 29, 2025, 17:04 IST

GATE 2026 Registration Update

GATE 2026: The Indian Institute of Technology (IIT) Guwahati has announced an extension for the registration period for the Graduate Aptitude Test in Engineering (GATE 2026). Candidates can now submit their applications without incurring late fees until October 6, 2025. For those who miss this deadline, applications will still be accepted until October 9, 2025, with a late fee. Interested individuals should apply through the official website gate2026.iitg.ac.in. The GATE exam is administered via computer-based testing and is jointly organized by the Indian Institute of Science (IISc), Bangalore, and the IITs on behalf of the Ministry of Education.

Exam Schedule and Details

The GATE 2026 examination is scheduled for February 7, 8, 14, and 15, 2026. The application process commenced on August 25, 2025.

Important Aspects of GATE 2026:
1. **Test Papers**: A total of 30 question papers will be available for the GATE 2026 exam.
2. **Test Combination**: Candidates may choose to appear for up to two papers from the approved combinations.
3. **Application Requirement**: Only one application is necessary for two papers.
4. **Language and Format**: All papers will be conducted in English and will consist of objective-type questions.
5. **Official Website**: gate2026.iitg.ac.in

Application Fees for GATE 2026

Application Fee Structure:
- For female/SC/ST/PWD candidates: ₹1000 during the regular application period; ₹1500 per paper during the extended period.
- For all other candidates: ₹2000 without late fees; ₹2500 with late fees.